RESEARCH

Atomic Layer Infiltration (ALI) / Vapor Phase Infiltration (VPI)

Atomic layer infiltration (ALI) also known as vapor phase infiltration (VPI) and sequential infiltration synthesis (SIS) is a vapor-phase process that exposes polymers to inorganic vapors that infuse into the polymer to transform it into an organic-inorganic hybrid materials.  Unlike other vapor “deposition” methods, ALI completely transforms the bulk chemistry of the entire material.  The Losego Lab is particularly interested in understanding the fundament process kinetics and chemical mechanisms of ALI as well as the complex hybrid structure of these materials that often mixes organic and inorganic constituents at a molecular level generating new material properties.  REVIEW ARTICLE

Atomic Layer Deposition

Atomic layer deposition is a chemical vapor deposition that uses a combination of sequential precursor delivery and self-limiting chemistry to achieve highly conformal thin film coatings with sub-nanometer thickness resolution.  The Losego Lab is particularly interested in the application of ALD to unconventional, non-planar substrates including powders, fabrics, and bioproducts as well as fundamental questions about composition and crystalline phase control in ALD synthesized materials.

Additive Manufacturing of Ceramics

Atomic layer deposition is a chemical vapor deposition that uses a combination of sequential precursor delivery and self-limiting chemistry to achieve highly conformal thin film coatings with sub-nanometer thickness resolution.  The Losego Lab is particularly interested in the application of ALD to unconventional, non-planar substrates including powders, fabrics, and bioproducts as well as fundamental questions about composition and crystalline phase control in ALD synthesized materials.